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Tatum Kobayashi
Tatum Kobayashi
Polymer chemistry
Materials science
Surface roughness
Dry etching
Silicon nitride
2
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6
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Influence of backbone chemistry on the post-exposure bake temperature sensitivity of 193-nm photoresists
2004
Young Cheol Bae
Teruaki Ogawa
Robert J. Kavanagh
Tatum Kobayashi
Tracy K. Lindsay
Tsutomu Tanaka
Cheng-Bai Xu
George W. Orsula
Jason DeSisto
Marie Hellion
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Mechanistic understanding of post-etch roughness in 193-nm photoresists
2003
Young Cheol Bae
George G. Barclay
Patrick J. Bolton
Robert J. Kavanagh
Lujia Bu
Tatum Kobayashi
Tim Adams
Nick Pugliano
James W. Thackeray
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Citations (6)
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