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K. van der Zanden

Infineon Technologies

4

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Use of Al2O3 as inter-poly dielectric in a production proven 130 nm embedded Flash technology

2008 Solid-state Electronics
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Performance and reliability of HfAlOx-based interpoly dielectrics for floating-gate Flash memory

2008 Solid-state Electronics
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Improved Retention for a Al2O3 IPD Embedded Flash Cell without Top-Oxide

2008 International Memory Workshop
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Improved Reliability of a High-k IPD Flash Cell through use of a Top-oxide

2007 International Memory Workshop
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