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Yutaka Miura
Yutaka Miura
Yokohama National University
Chlorine trifluoride
Reactive-ion etching
Etching
Atmospheric pressure
Chemical reaction
4
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48
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Etching Rate of Silicon Dioxide Using Chlorine Trifluoride Gas
2009
Japanese Journal of Applied Physics
Yutaka Miura
Yu Kasahara
Hitoshi Habuka
Naoto Takechi
Katsuya Fukae
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Citations (7)
Etching Rate Behavior of 4H-Silicon Carbide Using Chlorine Trifloride Gas
2008
Yutaka Miura
Yusuke Katsumi
Keiko Tanaka
Satoko Oda
Hitoshi Habuka
Yuan Gao
Yasushi Fukai
Katsuya Fukae
Tomohisa Kato
Hajime Okumura
Kazuo Arai
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Citations (6)
4H Silicon Carbide Etching Using Chlorine Trifluoride Gas
2008
Materials Science Forum
Hitoshi Habuka
Yusuke Katsumi
Yutaka Miura
Keiko Tanaka
Yasushi Fukai
Takaya Fukae
Yuan Gao
Tomohisa Kato
Hajime Okumura
Kazuo Arai
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Citations (11)
Determination of Etch Rate Behavior of 4H–SiC Using Chlorine Trifluoride Gas
2007
Japanese Journal of Applied Physics
Yutaka Miura
Hitoshi Habuka
Yusuke Katsumi
Satoko Oda
Yasushi Fukai
Katsuya Fukae
Tomohisa Kato
Hajime Okumura
Kazuo Arai
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Citations (24)
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