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C. Ouvard
C. Ouvard
Sputter deposition
Metal gate
Electronic engineering
Hafnium
Thermal stability
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Impact of TiN Metal gate on NBTI assessed by interface states and fast transient effect characterization
2007
IEDM | International Electron Devices Meeting
M. Rafik
X. Garros
G. Ribes
G. Ghibaudo
C. Hobbs
A. Zauner
M. Muller
V. Huard
C. Ouvard
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Citations (19)
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