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Martin Gutsche
Martin Gutsche
Siemens
Etching
Electronic engineering
Wafer
Computer science
Electronic circuit
4
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237
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Patterning of 0.175 μm platinum features using Ar/O2 chemically assisted ion-beam etching
2000
Journal of Vacuum Science & Technology B
Martin Gutsche
Satish D. Athavale
Kurt E. Williams
Danielle S. Hines
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A process for the etching of a metallization by means of a hard mask
1999
Martin Gutsche
Eike Lueken
Bruno Spuler
Georg Stojakovic
Peter Strobl
Stephan Wege
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(Ba,Sr)TiO 3 dielectrics for future stacked- capacitor DRAM
1999
Ibm Journal of Research and Development
David E. Kotecki
John David Baniecki
Hua Shen
R. B. Laibowitz
Katherine L. Saenger
J. Lian
Thomas M. Shaw
Satish D. Athavale
Cyril Cabral
Peter R. Duncombe
Martin Gutsche
Gerhard Kunkel
Young-Jin Park
Yun-Yu Wang
Richard S. Wise
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Citations (185)
Plasma-etching processes for ULSI semiconductor circuits
1999
Ibm Journal of Research and Development
Michael D. Armacost
Peter D. Hoh
Richard S. Wise
W. Yan
Jeffrey J. Brown
J.H. Keller
George A. Kaplita
Scott Halle
Kay Müller
M. D. Naeem
S. Srinivasan
Hung Y. Ng
Martin Gutsche
A. Gutmann
B. Spuler
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Citations (47)
1