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S. Schulte
S. Schulte
Altis Semiconductor
Oxide
Breakdown voltage
Gate oxide
CMOS
Plasma
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Gate oxide degradation due to plasma damage related charging while ILD cap oxide deposition - detection, localization and resolution
2003
PPID | International Symposium on Plasma Process-Induced Damage
S. Schulte
G. Dubois
D. Basso
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