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Bart Onsia
Bart Onsia
Dielectric
Chemistry
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Silicate
Hafnium
2
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Achieving Low- Ni-FUSI CMOS by Ultra-Thin Capping of Hafnium Silicate Dielectrics
2007
IEEE Electron Device Letters
A. Veloso
H. Yu
Shou-Zen Chang
Christoph Adelmann
Bart Onsia
S. Brus
Marc Demand
Anne Lauwers
B.J. O'Sullivan
R. Singanamalla
Geoffrey Pourtois
P. Lehnen
Sven Van Elshocht
Kristin De Meyer
M. Jurczak
P. Absil
S. Biesemans
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Integration of high-K gate dielectrics: Wet etch, cleaning and surface conditioning
2004
S. De Gendt
S. Beckx
Matty Caymax
Martine Claes
T. Conard
Annelies Delabie
W. Deweerd
David Hellin
Harald Kraus
Bart Onsia
V. Parashiv
Riikka L. Puurunen
E. Rohr
Jim Snow
W. Tsai
P. Van Doorne
S. Van Elshocht
Johan Vertommen
T. Witters
M. Heyns
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