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Johan Albert
Johan Albert
IMEC
Optoelectronics
Electronic engineering
Metal gate
CMOS
Materials science
3
Papers
14
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A new high-k/metal gate CMOS integration scheme (Diffusion and Gate Replacement) suppressing gate height asymmetry and compatible with high-thermal budget memory technologies
2014
IEDM | International Electron Devices Meeting
R. Ritzenthaler
T. Schram
Alessio Spessot
Christian Caillat
Moon Ju Cho
Eddy Simoen
Marc Aoulaiche
Johan Albert
S. A. Chew
K. B. Noh
Y. Son
Pierre C. Fazan
Naoto Horiguchi
Aaron Thean
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Citations (8)
Implanted Photoresist Remover for Advanced Nodes Including SiGe, Ge and High K-Metals
2012
Solid State Phenomena
Simon Braun
Rita Vos
Andreas Klipp
Martine Claes
Christian Bittner
Johan Albert
Naoto Horiguchi
Herbert Struyf
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Cleaning and Strip Requirement for Metal Gate Based CMOS Integration
2009
Tom Schram
Sebai Farid
Martine Cleas
Rita Vos
Masayuki Wada
Johan Albert
E. Rohr
S. Kubicek
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Citations (6)
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