Geometric optimisation for the deposition of high temperature superconductors

Abstract Laser ablation is a very promising and relatively straightforward technique for the deposition of thin high T c superconducting films. This method, however, can be limited by its ability to deposit layers uniformly over wide areas. This is due to a very highly forward directed ablation profile characteristic of the atomic removal process. In this paper, we show that a simple geometric modification of the deposition conditions can result in improved uniformity in the film growth over more extended areas, in our case of around 3 cm 2 .