Bottom-Anti-Reflective Coatings (BARC) for LFLE Double Patterning Process

Rikimaru Sakamoto, Takafumi Endo, Bang-Ching Ho, Shigeo Kimura,Tomohisa Ishida, Masakazu Kato, Noriaki Fujitani, Ryuji Onishi, Yoshiomi Hiroi, Daisuke Maruyama Semiconductor Materials Research Department, El ectronic Materials Research laboratories, Nissan Chemical Industries, Ltd.635 Sasakura, Fuchu-machi, Toyama 939-2792 Japan ABSTRACT Double patterning process with ArF immersion lithography has been developed as one of the most promising candidate for hp32 node and beyond. However complicated process flow and cost of ownership are the critical issue for this process. LELE (Litho-Etch-Litho-Etch) is the one of the standard process, but in order to reduce the process and cost, that LFLE(Litho-Freezing -Litho-Etch) and LLE (Litho-Litho-Etch) process have been investigated as the alternative process. In these processes, Organic Bo ttom-Anti-Reflective coating (BARC) is used two times with same film in both 1