Influences of deposition temperature on residual stress of HfO_2 films

HfO_2 films were prepared by electron beam evaporation.The residual stress was measured by ZYGO interferometer.The results showed that the residual stresses of HfO_2 films were tensile and increased with the increase of deposition temperature firstly,then decreased.The microstructure of the HfO_2 films was inspected with X-ray diffraction(XRD).The microstructure of the films transmitted from amorphous to polycrystalline,which corresponded to the variation of the residual stress.The microstructure of HfO_2 film changed as the deposition temperature increased and the residual stress evolved as the changing of the microstructure.