Photoreflectance of GaAs/Ga1-xAlxAs heterojunction bipolar transistor structures
1990
We have studied the photoreflectance spectra at 300 K from a number of
GaAs/Ga1AlAs heterojunction bipolar transistor (HBT) structures grown by molecular
beam epitaxy and metal-organic chemical vapor deposition. From the observed
Franz-Keldysh oscillations we have been able to evaluate the built-in dc electric
fields, F , in the Ga Al As emitter as well as the n GaAs collector region. In
dc 1-x x
addition, the Ga1AlAs band gap (and hence Al composition) has been determined.
The obtained values of Fd are in good agreement with numerically-computed values
for the analyzed HBT structures, thus making it possible to deduce doping levels in
these structures. The GaAlAs FKO have been correlated with device performance.
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