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Fluorocarbon Polymer-Based Photoresists for 157-nm Lithography
Fluorocarbon Polymer-Based Photoresists for 157-nm Lithography
2004
Theodore H. Fedynyshyn
William A. Mowers
Roderick R. Kunz
Roger F. Sinta
Michael Sworin
Alberto Cabral
Jane E. Curtin
Keywords:
Polymer
Fluorocarbon
Lithography
Resist
Composite material
Materials science
Nanotechnology
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