Old Web
English
Sign In
Acemap
>
Paper
>
Process Characteristics and Physical Properties of MO-ALD ZrO2 Thin Films Deposited in a 300 mm Deposition System
Process Characteristics and Physical Properties of MO-ALD ZrO2 Thin Films Deposited in a 300 mm Deposition System
2008
Steven Consiglio
Robert D. Clark
Cory Wajda
Masanobu Igeta
Gert Leusink
Takuya Sugawara
Hajime Nakabayashi
Keywords:
Thin film
Physical vapor deposition
Combustion chemical vapor deposition
Pulsed laser deposition
Carbon film
Materials science
Inorganic chemistry
Chemical engineering
Deposition (law)
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
4
Citations
NaN
KQI
[]