Phenyl decorated organic-inorganic hybridization millipore silicon dioxide film preparation method

The invention discloses a phenyl decorated organic-inorganic hybridization millipore silicon dioxide film preparation method, which belongs to the technical field of new materials and comprises the steps as follows: 1, 2-bis (triethoxysilane) ethane and ethanol are stirred under an ice water bath; then drops of nitric acid and water uniformly mixed in advance are gradually added one by one; then the mixture is added into a 60-DEG C water bath to stir for reaction for 2 hours to obtain a liquid; phenyltriethoxysilane and ethanol are uniformly mixed and gradually added into the mixed liquid to obtain stable sol with a mole ration of phenyltriethoxysilane to 1, 2-bis (triethoxysilane) ethane to ethanol to water to nitric acid being (0.2-0.6) to 1 to 18 to 12 to 0.2; the obtained sol and the ethanol are mixed with a volume ratio of 1 to 9; and the mixed sol is filmed on a gamma-Al2O3/alpha-Al2O3 porous ceramic support body in a clean room and is calcined after drying under a room temperature under the following conditions of 450-DEG C N2 atmosphere for calcining for 3 hours with a temperature rising and reducing speed of 1 DEG C/min; and the filming and calcining processes are repeated by 3 times. The phenyl decorated organic-inorganic hybridization millipore silicon dioxide film preparation method can be used for separating gases like hydrogen and carbon dioxide as well as carbon monoxide, etc.