Robust nanotransfer printing by imidization-induced interlocking

Abstract The importance of the nanotransfer technique has been increased owing to its possibility in nanoscale mass-production, enabled by cost-effective and simply fabricable features. In this study, we developed a novel method for robust nanotransfer printing based on imidization-induced mechanical interlocking. The proposed imidization-induced nanotransfer printing (InTP) method enables various metal nanostructures to be easily transferred onto a polyimide substrate based on the mechanical interlocking force by using a controlled imidization process. The designed functional nanopatterns are transferred with high robustness. In addition, using a partial imidization process, we apply an additional adhesion force at the pattern-substrate interface to transfer materials with poor intrinsic adhesion, such as nickel, successfully. Owing to the exceptional robustness of the method, various 3D nanostructures, such as asymmetric sidewalls, suspended nanowires, and dual-layer line patterns, can be successfully transferred. Moreover, the InTP method was used to fabricate a uniform and high-temperature film heater and an asymmetric blind film.