Development of Extreme-Ultraviolet Light Source by Laser-Produced Plasma

Extreme ultraviolet (EUV) radiation from laser-produced plasma has been studied for mass-production of the next generation semiconductor devices with EUV lithography. A full set of experimental databases are provided for a wide range of parameters of lasers and targets. These data are utilized directly as a technical guide-line for EUV source system design in the industry as well as used to benchmark the radiation hydrodynamic code, including equation-of-state solvers and advanced atomic kinetic models, dedicated for EUV plasma predictions. Present status of the LPP EUV source studies is presented.