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Highly Anisotropic Fluorine‐based Plasma Etching of Ultra‐Low Expansion Glass
Highly Anisotropic Fluorine‐based Plasma Etching of Ultra‐Low Expansion Glass
2021
Christoph Weigel
Hai Binh Phi
Felix Arthur Denissel
Martin Hoffmann
Stefan Sinzinger
Steffen Strehle
Keywords:
Glass etching
Materials science
Ultra low expansion glass
Plasma etching
Anisotropy
Fluorine
Composite material
Correction
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