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Etching of high-k HfO2 films in high-density chlorine-containing plasmas without rf biasing
Etching of high-k HfO2 films in high-density chlorine-containing plasmas without rf biasing
2006
Kouichi Ono
Keisuke Nakamura
Daisuke Hamada
Kazushi Osari
Koji Eriguchi
Keywords:
Dielectric
High-κ dielectric
Biasing
Reactive-ion etching
Plasma
Plasma etching
Nuclear magnetic resonance
Electron cyclotron resonance
Analytical chemistry
Materials science
Chlorine
high density
Etching
Correction
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