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Kazushi Osari
Kazushi Osari
Kyoto University
Analytical chemistry
Dielectric
Biasing
High-κ dielectric
Reactive-ion etching
3
Papers
49
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Etching of high-k HfO2 films in high-density chlorine-containing plasmas without rf biasing
2006
Bulletin of the American Physical Society
Kouichi Ono
Keisuke Nakamura
Daisuke Hamada
Kazushi Osari
Koji Eriguchi
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Etching of High-k Dielectric HfO2 Films in BCl3-Containing Plasmas Enhanced with O2 Addition
2006
Japanese Journal of Applied Physics
Tomohiro Kitagawa
Keisuke Nakamura
Kazushi Osari
Kazuo Takahashi
Kouichi Ono
Masanori Oosawa
Satoshi Hasaka
Minoru Inoue
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Plasma etching of high-k and metal gate materials
2006
Vacuum
Keisuke Nakamura
Tomohiro Kitagawa
Kazushi Osari
Kazuo Takahashi
Kouichi Ono
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Citations (23)
1