Influence of microstructure on electrochemical properties of Si/C multilayer thin-film anodes deposited using a sputtering method

Abstract Si/C multilayer films with different crystal structures were deposited on Cu substrate using magnetic sputtering, and the diffusion behaviors of Li + in the films were compared to those of XRD, SEM, and electrochemical cycling. The results show that Li + can completely diffuse into a 300 nm amorphous Si/C multilayer thin film under a charge/discharge current of 350 μA cm −2 , while in the case of crystallized films with [311] preferred orientation, a poor diffusion character was observed even under a current of 273 μA cm −2 .