Metal Sputtering Buffer Layer for High Performance Si-Based Water Oxidation Photoanode

2020 
The sputtering deposition commonly adopted in the photoelectrochemical water splitting device usually causes structure damage and accordingly performance degradation. Taking the Si-based photoanode...
    • Correction
    • Source
    • Cite
    • Save
    • Machine Reading By IdeaReader
    51
    References
    0
    Citations
    NaN
    KQI
    []