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Improvement of High-k/metal gate pMOSFET performances and reliability with optimism Si cap/SiGe channel structure
Improvement of High-k/metal gate pMOSFET performances and reliability with optimism Si cap/SiGe channel structure
2010
Chia-Wei Hsu
Y.K. Fang
C.Y. Chen
Wen-Kuan Yeh
Chien-Ting Lin
P. Y. Chen
Keywords:
High-κ dielectric
Nanotechnology
Electronic engineering
Materials science
Communication channel
Optoelectronics
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