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Double Patterning Lithography Alignment and OVL-Control Strategy for 20nm Technology
Double Patterning Lithography Alignment and OVL-Control Strategy for 20nm Technology
2014
Liwan Yue
Jingan Hao
Yuntao Jiang
Junqing Zhou
Ruixuan Huang
Guogui Deng
Keywords:
Nanotechnology
Multiple patterning
Lithography
Next-generation lithography
Materials science
double patterning lithography
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