Novel opportunities for thermal spray by PS-PVD

Abstract Plasma spray-physical vapor deposition (PS-PVD) is a novel coating process based on plasma spraying. In contrast to conventional methods, deposition takes place not only from liquid splats but also from nano-sized clusters and from the vapor phase. This offers new opportunities to obtain advanced microstructures and thus to comply with the growing demands on modern functional coatings. Thin and dense ceramic coatings as well as highly porous columnar structures can be achieved, offering novel opportunities for the application of thermal spray technology. This study describes process conditions, which are relevant for the formation of particular microstructures in the PS-PVD process. Following the structure of the process, the feedstock treatment close to the plasma source, plasma particle interaction in the open jet and the formation of coating microstructures on the substrate are covered. Calculated results on the plasma particle interaction under PS-PVD process conditions were found to be in good agreement with OES results and microstructural observations. They show that the feedstock treatment along the very first trajectory segment between injector and jet expansion plays a key role. Varying the plasma parameters, feedstock treatment can be controlled to a broad extent. Consequently, the manifold nature of the feedstock species arriving on the substrate enables to achieve various coating microstructures. As examples, application specific features of PS-PVD coatings are reported for strain-tolerant thermal barrier coatings as well as for gas-tight oxygen transport membranes with high mixed electronic‐ionic conductivity.