The influence of deposition temperatures on the structural and optical properties for NiO nanostructured thin films prepared via spray pyrolysis technique

Abstract This work presents the growth of Nickel oxide (NiO) thin films on glass substrates at different temperatures of 300,400, and 500 ∘ C . The chemical spray pyrolysis was used as relatively fast and vacuum-free method. The 0.15 M of nickel nitrate was prepared by dissolving 4.36 g of ( Ni ( NO 3 ) 2 . 6 H 2 O ) in 100 ml of distilled water. The film thickness was about (290 nm) which is measured by gravimetric method. The XRD, UVvis, and AFM spectroscopies used to study the structural, optical and morphological properties of the prepared films. The X-ray diffraction patterns showed that all films were preferentially orientated along (111) direction. Also, the direct allowed energy band-gap was (3.57 -3.73 eV), with a high absorption coefficient ( α ) greater than 10 4 cm − 1 . These specifications promote the sample’s suitability for solar cell applications.The surface morphology revealed nano-structured film with particles densely distributed across the substrate’s surface.