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Xe plasma FIB Delayering of IC based on 14 nm node technology
Xe plasma FIB Delayering of IC based on 14 nm node technology
2016
Jozef Vincenc Oboňa
Tomáš Hrnčíř
Sharang
Marek Šikula
Andrey Denisyuk
Keywords:
Analytical chemistry
Nanotechnology
Plasma
Materials science
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