Process for direct processing and bonding a layer of material

A method of processing at least a first layer of material having siloxane bonds of which at least one surface is intended to be secured to a surface of a second material layer by direct bonding, comprising at least one forced diffusion step, at least in the first layer of material, chemical species comprising at least one free electron pair and at least one labile proton, transforming at least a portion of the siloxane bonds in silanoles bonds in at least a portion of the first layer material extending from said surface to a depth greater than or equal to about 10 nm.