A scatterometry-based CD uniformity control solution for Spacer Patterning Technology
2012
Improving Critical Dimension Uniformity (CDU) for spacer double patterning features is a high priority for double
patterning technology. In spacer double patterning the gaps between the spacers are established through various
processes (litho, etch, deposition) with different process fingerprints and the CDU improvement of these gaps requires an
improved control solution. Such a control solution is built upon two pillars: metrology and a control strategy.
In this paper Spacer Patterning Technology CDU control using an angle resolved scatterometry tool is evaluated. CD
results obtained with this scatterometer on CDU wafers are measured and the results are correlated with those from the
traditional CD-SEM. CD wafer fingerprints are compared before and after applying the advanced control strategy and
CDU improvements are reported. Based on the results it is concluded that scatterometry qualifies for a spacer process
CDU control loop in a manufacturing environment.
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