Flexible Patterning of Functional Microdot by Laser-Induced Dot Transfer

Laser-induced dot transfer (LIDT) is one of promising additive manufacturing techniques because it can realize flexible patterning of micron and submicron-sized dots even at atmospheric room-temperature conditions. In the LIDT process, a laser pulse is tightly focused onto a source film, leading to a transient melting of the film followed by sub-spot transfer using one-to-one microdot deposition with laser-illuminated area. Recently, we have developed a novel double-pulse LIDT process using the first pulse for preheating the source film and the second pulse for dot transfer. To investigate the double-pulse effect on microdot transfer of oxides, temporal high-temperature distributions of a thick indium tin oxide source film during double-pulse irradiation have been simulated using a Finite Element Method (FEM) approach. As a result, preheating by the first pulse decreased a difference in film temperature along both the film thickness and in-plane directions. This is effective to avoid film fracture, leading to high-quality patterning of a wide variety of microdots.