Advanced electron-beam writing system EX-11 for next-generation mask fabrication

Toru Tojo,Ryoji Yoshikawa,Yoji Ogawa,Shuichi Tamamushi,Yoshiaki Hattori,Souji Koikari,Hideo Kusakabe,Takayuki Abe,Munehiro Ogasawara,Kiminobu Akeno,Hirohito Anze,Kiyoshi Hattori,Ryoichi Hirano,Shusuke Yoshitake,Tomohiro Iijima,Kenji Ohtoshi,Kazuto Matsuki,Naoharu Shimomura,Noboru Yamada,Hitoshi Higurashi,Noriaki Nakayamada,Yuuji Fukudome,Shigehiro Hara,Eiji Murakami,Takashi Kamikubo,Yasuo Suzuki,Susumu Oogi,Mitsuko Shimizu,Shinsuke Nishimura,Hideyuki Tsurumaki,Satoshi Yasuda,Kenji Ooki,Kiyomi Koyama,Susumu Watanabe,Mitsuhiro Yano,Hiroaki Suzuki,Hiroshi Hoshino,Masaki Toriumi,Osamu Watanabe,Kazuo Tsuji,Mitsunobu Katayama,Seiichi Tsuchiya,Kimio Suzuki,Shiro Kurasawa,Kazuyuki Okuzono,Hirokazu Yamada,Koji Handa,Yoshio Suzuki,Tetsu Akiyama,Yoshiaki Tada,Akira Noma,Tadahiro Takigawa

Advanced electron-beam writing system EX-11 for next-generation mask fabrication

1999

Toshiba and Toshiba Machine have developed an advanced electron beam writing system EX-11 for next-generation mask fabrication. EX-11 is a 50 kV variable-shaped beam lithography system for manufacturing 4x masks for 0.15 - 0.18 micrometer technology generation. Many breakthroughs were studied and applied to EX-11 to meet future mask-fabrication requirements, such as critical dimension and positioning accuracy. We have verified the accuracy required for 0.15 - 0.18 micrometer generation.

Keywords:

Micrometer
Nanotechnology
Cathode ray
Lithography
Fabrication
Beam (structure)
Materials science
Optoelectronics
Critical dimension
Optics

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