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Synchronous Plasma Pulsing for Etch Applications
Synchronous Plasma Pulsing for Etch Applications
2010
Maxime Darnon
C Petit Etienne
Erwine Pargon
Gilles Cunge
Laurent Vallier
P. Bodart
M. Haass
Olivier Joubert
Keywords:
Plasma
Analytical chemistry
Materials science
Optoelectronics
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