Resistivity size effect in epitaxial Ru(0001) layers

Epitaxial Ru(0001) layers are sputter deposited onto Al2O3(0001) substrates and their resistivity ρ measured both in situ and ex situ as a function of thickness d = 5–80 nm in order to quantify the resistivity scaling associated with electron-surface scattering. All layers have smooth surfaces with a root-mean-square roughness <0.4 nm, exhibit an epitaxial relationship with the substrate: Ru[0001]||Al2O3[0001] and Ru [101¯0]||Al2O3 [112¯0], and show no resistance change upon air exposure, suggesting negligible resistivity contributions from geometric surface roughness and grain boundary scattering and negligible changes in the surface scattering specularity p upon oxygen exposure. The room temperature ρ vs d data are well described by the semiclassical Fuchs-Sondheimer (FS) model, indicating a bulk electron mean free path λ = 6.7 ± 0.3 nm. However, the measured ρo × λ product at 77 K is 43% lower than at 295 K, suggesting a breakdown of the FS model and/or a thickness-dependent electron-phonon coupling an...