Cobalt-based compounds and methods for their preparation

describes a comprehensive metallic cobalt compound and a method of forming a cobalt-based metallic compound. In one embodiment, a cobalt comprehensive metallic compound, a dielectric layer disposed on a substrate, and an opening which is formed in the dielectric layer, the substrate is exposed. Further, the embodiment, a seed layer disposed over the substrate, and a cobalt complete filling material formed within the opening and on a surface of the seed layer.