An Approach to Trace Defects Propagation during SiC Epitaxy
2014
In this work, the generation of in-grown SFs, half-moon defects, and carrot defects in SiC epilayer is studied by using epitaxy-etch-epitaxy approach. It is found that under our growth conditions, most of these defects have a similar origin, and they nucleate at obstacles to step flow at the SiC substrate/epilayer interface. These obstacles may be micropipes, scratches, or foreign particles on the substrate surface.
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