TECHNOLOGICAL APROBATION OF INTEGRAL CLUSTER SET-UP FOR COMPLEX COMPOUND COMPOSITES SYNTESIS

In the present paper the results of technological approbation of the integral cluster set-up for synthesis of various types of high-quality coatings such as Al2O3, TiO2, ZrO2, AlN, TiN, and others with coating thickness up to 10 mkm are presented. Сurrent-voltage characteristics of magnetron discharge in argon mixtures with oxygen and nitrogen for various gas pressures and for various target materials have been measured. PACS: 52.77.-j, 81.15.-z