The fabrication of Co-Pt electro-deposited bit patterned media with nanoimprint lithography.

Bit patterned media with 25?nm hole diameter and 50?nm pitch size were fabricated with serial processes comprising master patterning with electron-beam lithography, a Si etching process, multi-layer soft stamp replication, and UV nanoimprinting, followed by Co?Pt magnetic material filling by electro-deposition. From these processes, the designed patterns were well defined, and perpendicular magnetic anisotropy of the fabricated bit patterned media was obtained.