Laser-focused atomic deposition

We have demonstrated the use of a standing-wave laser beam to focus chromium atoms as they deposit onto a silicon surface. A permanent array of Cr lines has been fabricated, with line width 65 nm, spacing 213 nm, and height 34 nm. The array covers an area of 0.4 mm X 1 mm, and was deposited in approximately 10 minutes. The lines made in this way constitute a proof-of- principle of an entirely new approach to nanostructure fabrication, with potential for extremely small feature size coupled with massive parallelism.© (1994) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.