Extreme Ultraviolet Lithography Source

The status of extreme ultraviolet lithography (EUVL),as the technology for nextgeneration lithography (NGL), in a rapidly developing stage is analyzed. The aim in this research areathat many researchers and projects focused on in some countries and districts, such as the US,Europe, Japan, Russian, to improve the resolution of lithography to 50 nm is illustrated. It is pointedout that EUV source is a core device of EUVL, now the main research work is to improve the energyconversion efficiency and output power, to lengthen the lifetime of the components of the source,and to reduce the costs.