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Chemical vapor deposition and characterization of zirconia films for high-k dielectric applications
Chemical vapor deposition and characterization of zirconia films for high-k dielectric applications
2005
Zhe Song
Douglas LeVan
John A. Roth
Timothy P. Hanusa
Robert A. Weller
Zhifeng Song
G. Kane Jennings
Robert A. Waller
Stefan Zöllner
Charles M. Lukehart
J. E. Wittig
Robert D. Geil
Vivek D. Pawar
Virginia Wahlig
Christy A. Hales
Matthew J. Vergne
Lisa M. Sullivan
Yang Fu
Lacey S. Fitts
Wenfeng Guo
Keywords:
Cubic zirconia
Chemical vapor deposition
Surface roughness
High-κ dielectric
X-ray photoelectron spectroscopy
Layer by layer
Silicon oxide
Analytical chemistry
Transmission electron microscopy
Materials science
Chemical engineering
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