Simulation of equipment design optimisation in microelectronics manufacturing

We explore different mathematical formulations, develop an object oriented simulation environment, and perform a parametric study in the design of a high yield low cost (raw material), and short cycle time chemical vapor deposition (CVD) reactor for microelectronic manufacturing. We begin with several possible configurations for the reactor and formulate them into their corresponding numerical optimization problems. We then develop a software architecture for solving the optimization problems by integrating the heat conduction and species transport simulation codes and a modern optimization software into an object oriented optimization environment. Numerical experiments are performed, reported and discussed.