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Modeling of C 4 F 8 inductively coupled plasmas: effects of high RF power on the plasma electrical properties
Modeling of C 4 F 8 inductively coupled plasmas: effects of high RF power on the plasma electrical properties
2019
Guillaume Le Dain
Ahmed Rhallabi
Aurélie Girard
Christophe Cardinaud
F. Roqueta
Mohamed Boufnichel
Keywords:
Atomic physics
RF power amplifier
Chemistry
C-4
Plasma
Correction
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