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Guillaume Le Dain
Guillaume Le Dain
University of Nantes
Plasma
Chemistry
Etching
Analytical chemistry
Dry etching
5
Papers
9
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Etching of iron and iron-chromium alloys using ICP-RIE chlorine plasma
2021
Plasma Sources Science and Technology
Guillaume Le Dain
Feriel Laourine
Stéphane Guilet
Thierry Czerwiec
G. Marcos
Cédric Noël
Gérard Henrion
Christophe Cardinaud
Aurélie Girard
Ahmed Rhallabi
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Etching of GeSe2 chalcogenide glass and its pulsed laser deposited thin films in SF6, SF6/Ar and SF6/O2 plasmas
2020
Plasma Sources Science and Technology
Thibaut Meyer
Guillaume Le Dain
Aurélie Girard
Ahmed Rhallabi
Marek Bouška
Petr Němec
Virginie Nazabal
Christophe Cardinaud
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Modeling of C 4 F 8 inductively coupled plasmas: effects of high RF power on the plasma electrical properties
2019
Plasma Sources Science and Technology
Guillaume Le Dain
Ahmed Rhallabi
Aurélie Girard
Christophe Cardinaud
F. Roqueta
Mohamed Boufnichel
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Modeling of silicon etching using Bosch process: Effects of oxygen addition on the plasma and surface properties
2018
Journal of Vacuum Science and Technology
Guillaume Le Dain
Ahmed Rhallabi
Christophe Cardinaud
Aurélie Girard
Marie-Claude Fernandez
Mohamed Boufnichel
Fabrice Roqueta
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Multiscale approach for simulation of silicon etching using SF6/C4F8 Bosch process
2017
Journal of Vacuum Science and Technology
Guillaume Le Dain
Ahmed Rhallabi
Marie Claude Fernandez
Mohamed Boufnichel
Fabrice Roqueta
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Citations (3)
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