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Marie-Claude Fernandez
Marie-Claude Fernandez
Plasma
Electron temperature
Atomic physics
Inductively coupled plasma
Distribution function
3
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43
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Modeling of silicon etching using Bosch process: Effects of oxygen addition on the plasma and surface properties
2018
Journal of Vacuum Science and Technology
Guillaume Le Dain
Ahmed Rhallabi
Christophe Cardinaud
Aurélie Girard
Marie-Claude Fernandez
Mohamed Boufnichel
Fabrice Roqueta
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Modeling of inductively coupled plasma SF6/O2/Ar plasma discharge: Effect of O2 on the plasma kinetic properties
2014
Journal of Vacuum Science and Technology
Amand Pateau
Ahmed Rhallabi
Marie-Claude Fernandez
Mohamed Boufnichel
Fabrice Roqueta
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Global Model of $\hbox{Cl}_{2}\hbox{/Ar}$ High-Density Plasma Discharge and 2-D Monte-Carlo Etching Model of InP
2012
IEEE Transactions on Plasma Science
Romain Chanson
Ahmed Rhallabi
Marie-Claude Fernandez
Christophe Cardinaud
S. Bouchoule
L. Gatilova
A. Talneau
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Citations (13)
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