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Amand Pateau
Amand Pateau
University of Nantes
Analytical chemistry
Plasma
Chemistry
Electronegativity
Atomic physics
4
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42
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Simulation of cryogenic silicon etching under SF6/O2/Ar plasma discharge
2016
Journal of Vacuum Science and Technology
Yehya Haidar
Ahmed Rhallabi
Amand Pateau
Arezki Mokrani
F. Taher
Fabrice Roqueta
Mohamed Boufnichel
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Citations (7)
Modeling of inductively coupled plasma SF6/O2/Ar plasma discharge: Effect of O2 on the plasma kinetic properties
2014
Journal of Vacuum Science and Technology
Amand Pateau
Ahmed Rhallabi
Marie-Claude Fernandez
Mohamed Boufnichel
Fabrice Roqueta
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Citations (27)
SF6 and C4F8 global kinetic models coupled to sheath models
2014
Plasma Sources Science and Technology
Yehya Haidar
Amand Pateau
Ahmed Rhallabi
Marie Claude Fernandez
Arezki Mokrani
F. Taher
Fabrice Roqueta
Mohamed Boufnichel
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Citations (8)
Multi-scale approach for simulation of deep silicon etching under ICP SF6/Ar plasma mixture
2012
Bulletin of the American Physical Society
Amand Pateau
Ahmed Rhallabi
Marie Claude Fernandez
Fabrice Roqueta
Mohamed Boufnichel
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