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Interplay between plasma modification of surfaces & atomic layer deposition for semiconductor applications
Interplay between plasma modification of surfaces & atomic layer deposition for semiconductor applications
2012
Johan Swerts
C. Adelmann
Silvia Armini
Annelies Delabie
Laura Nyns
M. Popovici
M. Schaekers
P. Verdonck
S. Van Elshocht
Keywords:
Plasma
Atomic layer deposition
Semiconductor
Chemistry
Molecular physics
Nanotechnology
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