Destruction of Solid С60F18 by Electron Beam

An extremely high rate of destruction of fluorinated fullerite С60F18 by accelerated electrons was revealed. This rate was three orders of magnitude higher than that of the ordinary fullerite C60. High rate of the modification was assumed to be caused by the efficient mechanism of fragmentation of С60F18 molecule compared to the mechanism of polymerization of fullerite C60. The conclusion has been made that films of fluorinated fullerites are perspective as an electron-beam resist for dry nanolithography.