Atomic Layer Deposition of Tungsten Oxide Using Nitrogen Dioxide: A Comparative Study with Other Oxygen Sources

Damon B. Farmer,Matthew Copel,Teodor K. Todorov,John A. Ott,Marinus Hopstaken,Holt Bui,Charles Tabachnick,G. Fraczak,George G. Totir

Atomic Layer Deposition of Tungsten Oxide Using Nitrogen Dioxide: A Comparative Study with Other Oxygen Sources

2021

Damon B. Farmer
Matthew Copel
Teodor K. Todorov
John A. Ott
Marinus Hopstaken
Holt Bui
Charles Tabachnick
G. Fraczak
George G. Totir

Atomic layer deposition of tungsten oxide thin films using bis(t-butylimido)-bis(dimethylamido)tungsten is investigated using various oxygen precursors. Significant amounts of unreacted nitrogen or...

Keywords:

Atomic layer deposition
Thin film
Nitrogen dioxide
Tungsten
Oxygen
Materials science
Nitrogen
tungsten oxide
Inorganic chemistry

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