Immobilization of Photocatalytic Material on the Suitable Substrate

In the world of increasing industrialization and global population, environmental pollution has continued to rise over last few decade. Photocatalysis came forward as capable method in removal of various recalcitrant pollutants from atmosphere. The nano-photocatalytic semiconductors are majorly used in the form of slurry, and removal of these nano-photocatalytic materials turns out to be quite challenging and costly. Therefore, to resolve the problem of recollection of material, voluminous strategies have been executed for immobilising nano-photocatalyst on various substrates including carbon-based compounds, glass, zeolites, polymers, clay and ceramics and various natural fibres. The strategies including sol-gel, dip coating, polymer-assisted hydrothermal discharge, photo-etching, electrophoretic deposition, cold plasma discharge (CPD), RF magnetron sputtering and spray pyrolysis are discussed in this chapter. At last, characterization techniques used for studying various properties of immobilized catalyst are discussed in brief.