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Optical Emission Spectroscopy Studies in ECR Plasma Used for the Deposition of Silicon Oxide Film
Optical Emission Spectroscopy Studies in ECR Plasma Used for the Deposition of Silicon Oxide Film
2013
Yu-Lin Hsieh
Shan-Yuan Chang
Tomi T. Li
Li-Cheng Hu
Chien-Chieh Lee
Jenq-Yang Chang
I-Chen Chen
Yen-Ho Chu
J.Y. Lee
S. H. Wang
Keywords:
Plasma
Silicon oxide
Materials science
Emission spectrum
Analytical chemistry
Deposition (law)
optical emission spectroscopy
Correction
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